The unique design of the ALD deposition cells allows for single-side ALD growth. Each cell consists of two precursor ‘curtains’, which are separated by a nitrogen purge ‘curtain’.
Once heated, the substrates continue to float through a series of ALD deposition cells. In the Levitrack, substrates float in a linear gas track and are heated to the required process temperature within a matter of seconds. The Levitrack ALD system is based on the innovative concept of spatial precursor separation, instead of precursor separation in time, and works in combination with the unique floating wafer and conductive heating technology used in the Levitech’s Levitor® RTP products. The Levitrack’s unique spatial ALD process and high throughput result in a superior cost-of-ownership of the overall passivation process flow and helps any client to address current and future technology needs. “This customer chose our Levitrack ALD system based on its significant productivity, cost-of-ownership and process advantages over competitive PECVD and ALD systems for aluminum oxide (Al2O3) applications, Beijersbergen concluded. This system will be used for PERC cells – with efficiencies exceeding 20% –, as well as multi-crystalline and n-type products”, said Jaap Beijersbergen, CEO of Levitech. They decided to order a second system for their expansion for the production of high-efficiency crystalline solar cells. “The Levitrack has a proven record in high volume manufacturing and our customer was satisfied with the excellent performance. ALMERE, The Netherlands – Ma– Levitech BV today announced that one of Taiwan’s largest solar cell manufacturers transferred a Levitrack Atomic Layer Deposition (ALD) system to manufacturing, and placed an order for a second Levitrack system to be shipped in the second quarter.